Micro and nanofabrication service

Ultra-High resolution lithography by Electron Beam (EBL)
85€/h
High resolution Optical Lithography // spinner 55€/h // 40€/h
Ultra-High resolution etching by Focused Ion Beam (FIB) 140€/h
Dry etching by Reactive Plasma (RIE) 65€/h
Dry etching by Ion Milling 65€/h
Dielectrics deposition by PECVD 55€/h
Metal deposition by sputtering and electron beam 60€/h
Wet etching and Cleaning 25€/h
Characterization 70€/h
Process Engineer 75€/h
Technician 45€/h


Prices per hour (VAT excluded)
©Instituto de Micro y Nanotecnología
Isaac Newton 8, 28760 Tres Cantos, Madrid
Tel. +34 91 806 0700 Fax +34 91 806 0701
Webmail FECYT WOK
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